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Plasma Cleaning machine for plasma surface modification

Name: Plasma Cleaning machine for plasma surface modification
Brand: kejia
Availability: InStock

FOB Price

USD $3,000 - $8,500 / Set

1 Set(Min.Order)

Supply Ability 300 Set / Sets per Month
Port China port
Payment Terms:T/T Credit Card

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Product Details

Condition:	New	Place of Origin:	Henan, China	Brand Name:	kejia
Model Number:	EQ-PDC-32G-LD	Feature:	Critical Cleaning / Residue Free, Non-Ionic, Non-Toxic, Rust / Corrosion Inhibitor, Sudsing / Foaming	Fuel:	Electric
Certification:	CE	Use:	Other, plasma cleaner	Material:	Glass / Ceramic

Product Description

Specifications

compact and low cost plasma cleaner which is designed to clean and remove nanoscale organic contamination

EQ-PDC-32G is a compact and low cost plasma cleaner which is designed to clean and remove nanoscale organic contamination on wafer upto 2" with air, oxygen, or argon plasma. The rate of organic removal is about 10 nm/min Max. at high RF power. It is an excellent tool to pre-clean single crystal substrate before expitaxial film deposition to the acheive a better quality. If you don't have any experience for plasma surface cleaning, please refer to the articles as the follows:

McIntire, Theresa M., S. Rachelle Smalley, John T. Newberg, A. Scott Lea, John C. Hemminger, Barbara J. Finlayson-Pitts. "Substrate Changes Associated with the Chemistry of Self-Assembled Monolayers on Silicon." Langmuir (2006) 22(13): 5617-5624.
Sumner, Ann Louise, Erik J. Menke, Yael Dubowski, John T. Newberg, Reginald M. Penner, John C. Hemminger, Lisa M. Wingen, Theo Brauers, Barbara J. Finlayson-Pitts. "The Nature of Water on Surfaces of Laboratory Systems and Implications for Heterogeneous Chemistry in the Troposphere." Phys. Chem. Chem. Phys. (2004) 6: 604-613.
Mennicke, Ulrike, Tim Salditt. "Preparation of Solid-Supported Lipid Bilayers by Spin-Coating." Langmuir (2002) 18: 8172-8177

SPECIFICATIONS

Input Power

AC 110V (for operation under AC220V, we provide additional 500W transformer),

please select in option bar

RF Power

RF power (High voltage & high frequency current applied on the coil) is adjustable

at three levels:

Low Setting	680V	10 mA	6.8W
Medium Setting	700V	15 mA	10.5W
High Setting	720V	25 mA	18W

Features

Compact, tabletop unit
Adjustable RF power
Low, Medium, and High power settings
High purity 3" quartz chamber
Safe operation at low cost and environmental freindly

Plasma Chamber

3" diameter x 6.5" length high purity quartz chamber
A removable front cover assembly

Vacuum Pump and Valve

Double Step Rotary Vane Vacuum Pump (110V, 226 L/m) with Exhaust Filter -
EQ-2TW-4C is included with pipe for AC110V voltage; 120 L/m Rotary Vane

Vacuum Pump with Oil Trap, Exhaust Filter -EQ-2XZ is included with pipe for AC220V

voltage. (Ultimate total pressure of 30 mTorr. Only one vacuum pump is included

in one package)

1/8" NPT needle valve to qualitatively control gas flow and chamber pressure.
1/8" NPT 3-way valve to quickly switch from bleeding in gas, isolating the
chamber, and venting.

Inert gas

Many inert gases can be choosen for plasma cleaning, such as N2, Ar
, Air and Mixed gas depended on what kind material will be treated. ( not included in the package)
No flammable gas shall be used for the plasma cleaner.

Overall dimension

8.5" H x 10" W x 8" D

Net Weight

17 Lbs without pump
37 Lbs with vacuum pump

other related products that we can supply

Zhengzhou Kejia Furnace Co., Ltd.
Tel.: +86-371-67826992

Fax: +86-371-67197091

Web:

msn:wangyanna912950531 (at)

Mobile No.: +86 18137195603

Skype: tanyawang55

QQ ID: 912950531

Email:export(at)

Contact Us

Zhengzhou Kejia Furnace Co., Ltd.: Contact nameLily Li
Chat Now; Phone86-371-67826992; AddressBeigang Industrial Park, Zhengshang Road, Zhengzhou Zhengzhou,Henan

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